PLASMA MONITORING
Process optimization and quality control
Plasma monitoring
Spectropol offers tools for analysis, monitoring and optimization of processes using plasma.
Plasma - ionized matter with a gas-like state of matter in which a significant part of the particles are electrically charged. Even though plasma contains free charged particles (ions and electrons), on a macroscopic scale it is electrically neutral. Process control is particularly important in industrial plasma applications to ensure process repeatability and quality.
Optical emission spectroscopy is the technique of first choice because it does not disturb the plasma and the results are obtained in real time.
For plasma monitoring, we mainly use PLASUS products (configured systems) and we also use spectrophotometers from our suppliers to build own systems.
EMICON SA systems are the first choice for comprehensive process control and quality assurance of plasma processes on production lines. Thanks to the unique acquisition and connection of all important process data in one system in real time, EMICON systems are a global model for effective process control.
ADVANTAGES
wide spectral range
real-time monitoring process optimization and control
multichannel
industrial and R&D applications
industrial PROFIBUS and LAN interface
PLASUS standard systems:
EMICON SA: free-standing system for application on the production line
EMICON SA-HIPIMS: free-standing, on-line system for pulsed processes
EMICON HR: high resolution system for plasma monitoring and analysis
EMICON MC: the standard multi-channel plasma monitoring and process control system.
EMICON LC: system used for the inspection of thin films
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Multi-channel system used on production lines
EMICON SA systems are the first choice for comprehensive process control and quality assurance of plasma processes in industrial plants and production lines. Thanks to the unique combination that enables the collection of all important process data in one system in real time, EMICON SA systems are a global model for effective process control.
TECHNICAL DATA:
Number of spectral channels 1-8
Spectral resolution 1.5 nm
Wavelength range 200 - 1100 nm
Signal resolution 16 bits
Instantaneous resolution 1 ms to several minutes
Sensor input 0-10V (2/4)
Analog control outputs 0-10V (4/8)
Digital inputs and outputs: TTL 5V/24V (8/8)
LAN (TCP/IP)
Fieldbus network protocol: Profibus, Profinet, EtcherCAT, EtcherNET/IP, OPC-UA
FUNCTIONALITY
autonomous work (24/7)
Process control with PID and setpoint function
Fast voltage outputs for process control, e.g. gas flow or power
Multi-channel systems for spatially resolved measurements
Voltage inputs for external sensor signals
Current/voltage inputs for time-resolved pulse curves
Digital inputs and outputs for external system control
Fieldbus support and LAN interface for system integration
Preparing data for applications based on Industry 4.0 and AI
Configuration via LAN using EMICON SA Manager software for Windows
Modular configuration according to the requirements profile
APPLICATION
Process analysis and monitoring
Monitoring and securing process stability
Process control in reactive sputtering processes
Monitoring the condition of the chamber
Plasma contamination detection and monitoring
Process monitoring with spatial resolution in large-scale applications
Modernization of PEM systems
A multi-channel system used to optimize and control the quality of impulse processes.
In addition to measuring spectral data, the EMICON SA-HIPIMS system records voltage and current waveforms in pulsed plasma processes (HIPIMS) with high time resolution. This unique combination of data collection allows independent control of ion density and gas composition. In reactive processes, this opens the door to separately tuning the stoichiometric and morphological properties of the layer.
TECHNICAL DATA:
Number of spectral channels 1-8
Analog pulse inputs ± 1V (2x)
Sampling frequency 40 MHz
Pulse trigger outputs analog ± 5V (1x) optical (2x)
Analog control outputs 0-10V (4/8)
LAN (TCP/IP)
Fieldbus network protocol: Profibus, Profinet, EtcherCAT, EtcherNET/IP, OPC-UA
FUNCTIONALITY
Data recording of electrical signals with high time resolution
Combining spectral and electrical measurement data in real time
Real-time recording of current and voltage signals in the pulse process (HIPIMS).
Acquisition, monitoring and assessment of the shape of the heart rate curve
Analog and optical trigger inputs for synchronized recording of impulse and spectral data
All features of the EMICON SA system
Configuration via LAN using EMICON SA Manager software for Windows
APPLICATION
Plasma analysis in pulsed plasma applications (HIPIMS, DC pulse, ...)
Process monitoring and optimization of pulsed plasma application processes
Independent control of gas flow and ion density in reactive HIPIMS processes
Monitoring and securing process stability
Observation and compensation of target erosion
A multi-channel system used for process optimization and quality control.
EMICON MC systems are ideal plasma monitor systems for R&D and suitable for almost all plasma technology applications, including plasma analysis, plasma monitoring and process optimization.
TECHNICAL DATA:
Number of spectral channels 1-8
Spectral resolution 1.5 nm
Instantaneous resolution 20 ms to several minutes
Wavelength range 200 - 1100 nm
Signal resolution 16 bits
USB 2.0 interface
Digital inputs and outputs: TTL 5V (2/4)
Analog control outputs ± 10 volts (4/8)
FUNCTIONALITY
Data acquisition using broadband spectrometers
Real-time monitoring of plasma radiation
Process control with PID and setpoint function
Multi-channel systems for spatially resolved measurements
Playback of saved measurement data for process analysis
Digital and analog inputs and outputs for external sysdt
APPLICATION
Process monitoring and optimization
Process stability monitoring
Endpoint detection in plasma etching processes
Detection of plasma contamination
Leak detection
Determining layer properties (LC module required)
Single-channel high resolution system
The EMICON HR system is a high resolution spectral plasma monitor and is particularly suitable for detailed plasma spectral analysis and plasma monitoring. With almost 10 times better spectral resolution compared to other models, EMICON HR provides significantly better spectral separation of adjacent atomic lines and resolution of vibrational and rotational lines in molecular bands.
TECHNICAL DATA:
Number of spectral channels 1
Spectral resolution 0.2-0.5 nm
Instantaneous resolution 50 ms to several minutes
Wavelength range 200 - 860 nm
Signal resolution 16 bits
USB 2.0 interface
Digital inputs and outputs: TTL 5V (4/4)
FUNCTIONALITY
Data acquisition using a high-resolution broadband spectrometer
Real-time monitoring of plasma radiation
Plasma analysis and process monitoring
Playback of saved measurement data for process analysis
Process control with setpoint function
Digital and analog inputs and outputs for system integration
Convenient EMICON MC software for Windows
APPLICATION
Spectral analysis of plasma processes
Process monitoring and process optimization
Process stability monitoring
Endpoint detection in plasma etching processes
Detection and monitoring of plasma contamination
Stand-alone or complementary system for monitoring thin films
The EMICON LC system is the ideal extension of the EMICON SA and EMICON MC systems for real-time in situ monitoring of transmission, reflection, absorption, color or coating thickness on a workpiece during the plasma process. It can be integrated with EMICON systems models SA and MC as an additional module. The stand-alone version of EMICON LC can be used for plasma-free layering processes.
TECHNICAL DATA:
Number of spectral channels 1-2
Spectral resolution 1.5 nm
Instantaneous resolution 20 ms to several minutes
Wavelength range 350 - 1100 nm
Signal resolution 16 bits
Light source: halogen, LED, ...
Coating thickness 5 nm to 2 μm
Color space L*a*b*, XYZ
FUNCTIONALITY
Data acquisition using broadband spectrometers
Calculation of spectral reflection, transmission and absorption
Determination of layer thickness using real-time spectral analysis
Calculate color values in real time
Combined analysis of process data and film properties
Available light sources adapted to specific applications (tungsten halogen, LED, ...)
Optical components for vacuum applications
Program control with expansion module for convenient EMICON MC software
APPLICATION
Simultaneous process and product control
In-situ measurement of reflection, transmission and absorption
Determination of layer thickness in real time
Calculating color values in-line and in-situ
Quality control
Contact us to determine the system parameters
Thanks to our suppliers, we are able to configure a tailor-made system.
Send us your expectations.
SpecLine is one of the best tools for evaluating spectral data.
The unique database of spectral lines allows for quick identification of elements and molecules.
3 software versions:
A - mini - containing spectral lines of atoms and ions
AM - medium - containing lines of atoms and ions and selected lines of (diatomic) molecules
AMS - max - containing all atoms, ions and molecules
FUNCTIONALITY
Extensive database with spectral lines for atoms, ions and molecules
Automatic search for line peaks in spectra
Automatic identification of atomic and ionic lines and molecular bands
Overlay and compare multiple spectra – even across different file formats
Wide range of functions for spectra evaluation. Data import in all popular spectroscopic file formats
Data export to ASCII, binary and Excel (CSV), graphics export to JPG, PNG, GIF and BMP
SUPPLIERS
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