Jednokanałowy system wysokiej rozdzielczości (0,15nm) dostosowany zarówno do analizy spektralnej plazmy jak i monitoringu procesu.
The spectral range of 200-860 nm of the EMICON HR system covers the important parts of the UV-VIS-NIR region. Due to the 10 times better spectral resolution of the EMICON HR system compared to the standard systems neighboring atomic lines or rotational and vibrational lines of molecular bands can be resolved easily. The compact design without any moving parts and the USB 2.0 data transfer makes the EMICON HR system a very mobile system which can be used easily at many applications.
The EMICON software provides extensive features especially for spectral analysis, for plasma analysis and plasma monitoring: arithmetic of spectra, replay of saved data, recipe manager and much more.
Specifications
| EMICON HR High-Resolution |
|
| Number of Channels | 1 |
| Wavelength range [nm] | 200 - 860 |
| Spectral resolution [nm] | 0.15 |
| Signal resolution | 16 Bit |
| Digital in/out | 2/2 |
| Analog out | 4 |
| Connectivity | USB 2.0 |
Applications
Spectral analysis of process plasmas
Monitoring and optimizing plasma processes
Monitoring of process stability
Endpoint detection in plasma etching
Detection and monitoring plasma impurities
Features
Data acquisition with broad band spectrometer
Real-time monitoring of plasma radiation
Process analysis and process monitoring
Replay of saved data for off-line process analysis
Process control with set-point function
Digital and analog inputs and outputs for system integration
PROFIBUS and LAN interface for integration in system control
User friendly Windows software
Technical Data
Wavelength range: 200 ... 860 nm
Spectral resolution: 0.15 nm
1 spectrometer channels
Time resolution: approx. 20 ms to hours
Analog outputs: ± 10 volts
Digital inputs and outputs: TTL
Applications:
- Plasma diagnostics, spectral analysis
- Film deposition (PVD, PECVD)
- Plasma etching, end-point detection
- Quality control, fault detection
