Luty 2019

Wypróbuj produkty LUMERICAL
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30 dni za darmo! W tym czasie możesz skorzystać z przygotowanych pakietów wg zastosowań lub poszczególnych rozwiązań MODE, FDTD, INTERCONNECT lub DEVICE.

Luty 2019

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Wiosenne promocje w ofercie Ocean Optics

Promocje obejmują:
* 10% zniżki na spektrometry NIR, QE Pro i MZ5 ATM-MIR
* 20% zniżki na czujniki tlenu NeoFox

Luty 2019

Lasery SpitLight w jeszcze lepszej cenie
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Sprawdź lepsze ceny w ofercie renomowanej niemieckiej firmy InnoLas.

Luty 2019

SELEKTOR OPTYKI
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Znajdź odpowiednie lustro, zwierciadło lub soczewkę. Dobierz odpowiednie parametry

Luty 2019

Najbardziej wszechstronny portfel kamer sCMOS
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Wyjątkowe połączenie wysokiej rozdzielczości, wydajności kwantowej, zakresu dynamicznego i wysokiej częstotliwości odświeżania.

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Exicor® (Point and Scanning Birefringence Measurement Systems)

 

Exicor birefringence measurement systems are well-suited to Industrial and Academic Research, Quality Assurance, and Production (off line and on line) environments. This advanced technology, based on the Hinds Instruments Photoelastic Modulator (PEM), and recipient of three separate “R&D 100” awards, provides high speed measurement of optical retardation and fast axis orientation with excellent accuracy, resolution and repeatability!

Exicor OIA

 

Oblique Incident Angle Birefringence Measurement System

 

The Hinds™ Instruments Exicor® OIA is the Premier Birefringence Measurement System for the evaluation of Lenses, Parallel Faced Optics and Curved Optics at normal and oblique incident angles. The system is built on Hinds Instruments award winning Photoelastic Modulator (PEM) based Exicor Birefringence Measurement technology. This next generation birefringence measurement system is providing the industry with new capabilities in the analysis and development of next generation lithographic lenses, lens blank and high value precious optics.

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Exicor PV-SI

 

During the production of Si solar panels, stress in Si crystals often remains undetected long into the fabrication process. Hinds Instruments has developed a stress birefringence instrument for measuring Si ingots, either squared or as-grown, before they are sawed into wafers. When this instrument is used as a QC tool, low quality Si ingots or segments can be identified before subsequent processing costs are incurred. In addition, this instrument provides growers of Si crystals a tool with which to improve the quality of Si ingots so they can produce thinner wafers with low mechanical yield loss.

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Exicor®

 

Hinds Instruments Birefringence Measurement technology has been adopted by industry leaders world wide to measure birefringence and characterize stress birefringence in materials with unsurpassed accuracy, resolution and repeatability. Capable of measuring optical retardation at 0.001nm resolution with noise floors as low as 0.005nm, these systems are robust, dynamic and scalable to fit the demanding requirements of your application. We provide measurement systems across the light spectrum (DUV, VIS and NIR) and are able to measure virtually all optical materials.

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