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SEIWA Optical Microscope Objectives

FOR INDUSTRY AND RESEARCH

Exploring Microscope Objectives

Optics play a crucial role in both cameras and microscopes, serving as the primary components that focus and magnify light to create clear and detailed images. Despite their shared fundamental principles, the objectives and lenses in these devices are tailored to meet distinct requirements based on their specific applications. This article delves into the objectives and lenses used in cameras and microscopes, highlighting their objectives, design, and functionalities.

Microscope objectives aim to magnify tiny specimens while maintaining high resolution and clarity. These lenses are crucial in scientific research and medical diagnostics, where observing fine details is essential.

Types of

Microscope Objectives

  1. M Plan Apo
  2. M Plan Apo HR
  3. PE IR
  4. PE IR 2000 HR
  5. NUV Plan APO
  6. DUV Plan APO
  7. Infinity M Plan

M Plan APO SEIWA Optical Objectivesz

SEIWA’s M Plan Apo lenses are high-resolution, long working distance objectives designed primarily for visible light applications. These lenses are compatible with PS-888 series microscopes and offer brightfield imaging with excellent optical correction.

  • Long working distance
  • Applications: Semiconductor inspection, Precision measurement, Brightfield microscopy for industrial and research use

M Plan APO HR SEIWA Optical Objectives

An enhanced version of the M Plan Apo series offering a larger image circle (up to 33mm) and a wider field of view, ideal for video microscopy and larger sensor formats. These lenses maintain superb correction and resolution for demanding inspection tasks.

  • Enlarged image circle: 33 mm (7x larger than standard M Plan Apo)
  • Long working distance
  • Magnifications typically from 1.5X to 10X+
  • Applications: Video microscopy, Large field-of-view imaging, Metrology and inspection with high resolution requirements

PE IR SEIWA Optical Objectives

PE IR lenses are designed for near-infrared (NIR) wavelengths (800-1600 nm), suitable for backside wafer inspection and photo emission detection. They offer good working distance and high numerical aperture optimized for NIR light.

Olympus Plan Fluorite Objectives are versatile lenses designed for a wide range of microscopy techniques including brightfield, darkfield, DIC, fluorescence, and polarization.

  • Magnifications from 1X up to 100X
  • Working distances from ~9.5 mm to 30 mm
  • High N.A. up to 0.71
  • Transmission in NIR spectrum (800-1600 nm)
  • Applications: Backside inspection of wafers, Photo emission detection, Laser marking and cutting, Semiconductor and material analysis

PE IR 2000 HR SEIWA Optical Objectives

These are specialized short-wave infrared (SWIR) lenses with extended transmission in the 1000-2000 nm range, offering very high resolution and color correction over this broad wavelength. Designed for failure analysis and detection of extremely weak emission signals.

  • Magnifications: 10X, 20X, 50X
  • Working distance ~10-20 mm
  • High N.A. up to 0.7
  • Transmission range: 1000-2000 nm
  • Color corrected for wide SWIR range
  • Applications: Failure analysis of semiconductor devices, Detection of leakage currents and weak photo emissions, Advanced industrial inspection using SWIR imaging

NUV Plan APO SEIWA Optical Objectives

NUV Plan APO lenses are high-resolution objectives optimized for near-ultraviolet wavelengths down to 355 nm. They provide super long working distances and are corrected for bright field and near UV imaging.

  • Magnifications such as 20X and 50X
  • Long working distance (e.g., 10-12 mm)
  • High N.A. ~0.5
  • Applications: Semiconductor and LCD circuit repair, Thin film processing, UV laser applications and imaging

DUV Plan APO SEIWA Optical Objectives

DUV Plan APO objectives extend transmission further into deep ultraviolet (DUV) wavelengths (~266 nm), while maintaining high performance in visible light. These lenses support extremely precise laser cutting and repair tasks.

  • High transmission down to 266 nm (DUV)
  • Also transmits visible light up to 532 nm
  • Suitable for Nd:YAG laser wavelengths
  • High resolution and long working distance
  • Applications: Semiconductor and LCD laser cutting and repair, Advanced photolithography, UV laser machining and processing

Infinity M Plan SEIWA Optical Objectives

Infinity-corrected M Plan series lenses offer flexible integration into modern optical systems with infinity optics. They maintain high resolution and long working distance, suitable for industrial and research microscopes.

  • Infinity-corrected optical design
  • Magnifications commonly from 10X to 40X
  • Working distances ~10 mm
  • High N.A. for sharp imaging
  • Applications: Systems requiring infinity-corrected optics, Industrial inspection, Measurement and metrology systems

SEARCH:

  • Choose a specific value to narrow down the table.
  • The match must be exact
  • For example: “UV”, “HR”, “100X”, “APO”
ModelMagnificationWorking Distance (mm)N.A.Resolving Power RP (μm)Focal Depth DOF (μm)Focal Length (mm):Wavelength (nm):
NIR Plan
PEIR-Plan-1x
SEIWA PE_IR_1X
1x120.0322.4611200800 – 1600
NIR Plan
PEIR-Plan-10X
SEIWA PE_IR_10X
10x30.7 9czy 30.4)0.272.57.520550 – 1600
NIR Plan
PEIR-Plan-2.5x
SEIWA PE_IR_2.5X
2.5x280.16.75580450 – 1600
NIR Plan
PEIR-Plan-20x
SEIWA PE_IR_20X
20x120.51.32.210800 – 1600
NIR Plan
PEIR-Plan-50x
SEIWA PE_IR_50X
50x10.00.61.11.54900 – 1600
NIR Plan
PEIR-Plan-100x
SEIWA PE_IR_100X
100x9.50.710.90.92900 – 1400
SWIR High Resolution
PE IR 50X 2000 HR
SEIWA PE IR 50X 2000 HR
50x10.00.71.41.241000 – 2000
SWIR High Resolution
PE IR 20X 2000 HR
SWIR High Resolution 20X
20x10.00.61.62.1101000 – 2000
SWIR High Resolution Silicon Correction
PE IR 50X 2000 HRS
NEW
50x100.71.541000 – 2000
SWIR High Resolution Silicon Correction
PE IR 20X 2000 HRS
NEW
20x100.62.1101000 – 2000
SWIR High Resolution Silicon Correction
PE IR 10X 2000 HRS
NEW
10X200.337.1201000 – 2000
VIS M Plan Apochromat
M.PlanAPO100XSBS
VIS M Plan Apochromat 100X
100x14.10.520.612VIS
VIS M Plan Apochromat
M.PlanAPO50XSBS
VIS M Plan Apochromat 50X
50x18.30.400.81.74VIS
VIS M Plan Apochromat
M.PlanAPO20XS
VIS M Plan Apochromat 20X
20x20.00.420.81.7 (czy 1.5)10VIS
VIS M Plan Apochromat
M.PlanAPO10XS
VIS M Plan Apochromat 10X
10x38.90.231.55.220VIS
VIS M Plan Apochromat
M.PlanAPO5XSBS
VIS M Plan Apochromat 5X
5x36.10.162.110.740VIS
VIS M Plan Apochromat High Resolution
M.PlanAPO1.5HR
VIS M Plan Apochromat High Resolution
1.5x250.0487.4119.3133,38450-679
VIS M Plan Apochromat / M Plan Apochromat High Resolution
M.PlanAPO2.5XHR
VIS M Plan Apochromat High Resolution 2.5
2.5x330.084.242.980450-680
VIS M Plan Apochromat High Resolution
M.PlanAPO5XHR
VIS M Plan Apochromat High Resolution 5X
5x340.162.110.740450-680
Infinity M Plan
M-Plan-40x-LCD11

Infinity M Plan 40X
40x10.30.520.314,49
Infinity M Plan
M-Plan-20x-LCD11
Infinity M Plan 20X
20x10.50.420.41.68,99
Infinity M Plan
M-Plan-10x-LCD11
Infinity M Plan 10X
10x10.80.250.7118
NUV Plan Apochromat
NUV PlanAPO 50X
SEIWA NUV Plan APO 50X
50x10.00.50.61.14355-1064
NUV Plan Apochromat
NUV Plan APO 20X
SEIWA NUV Plan APO 20X
20x120.50.61.110355-1064
DUV Plan Apochromat
DUV-PlanAPO-50x
SEIWA DUV Plan APochromat 50X
50x12.20.400.841.74266-532
DUV Plan Apochromat
DUV-PlanAPO-20x
DUV Plan Apochromat 20X
20x15.50.360.932.110266-532

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