Mitutoyo Microscope Objectives

• Plan Apochromat Optical Design, delivers high numerical apertures (NA) and excellent contrast, corrects chromatic aberrations in the visible spectrum (435–655 nm).
• Long Working Distances, enables clear imaging of samples without interference from adjacent structures or equipment.
• Applications: Ideal for surface inspection, metrology, and advanced life science microscopy.

Available models:

• BD Plan Apo Series: 2X, 5X, 7.5X, 10X, 20X, 50X, 100X (WD: 34 mm down to 6 mm depending on magnification)
• BD Plan Apo SL (Super Long WD): 20X SL (WD: 30.5 mm), 50X SL (WD: 20.0 mm)
• BD Plan Apo HR (High Resolution): 50X HR (WD: 5.2 mm), 100X HR (WD: 1.3 mm)

• Plan Apochromatic Optics, correct chromatic aberrations for high-contrast, high-clarity imaging, optimized specifically for WLI precision measurement tasks.
• High Resolution & Long Working Distance, 60 mm parfocal working distance for improved sample clearance and greater flexibility, maintains compact and lightweight design.
• Integrated Interferometry Enhancements, internal beam splitter for efficient light routing, Interference fringe adjustment mechanism for precise control and measurement consistency.
• Magnification Range available from 2.5× to 50×.
• Tube Lens Compatibility: Designed for a 100 mm focal length tube lens (sold separately).
• Applications: Medical Imaging in interferometric setups, Vertical Scanning Interferometry (VSI), 3D Surface Profiling

• Long Working Distances, optimized to provide clearance between the objective and the sample, ideal for large or delicate specimens.
• High-Quality Plan Apochromat Design, flat image field across the entire view, corrects chromatic aberrations for red, blue, and yellow wavelengths (superior to standard achromatic correction), high NA and contrast for improved resolution.
• Optimized for Brightfield Illumination, Incident light path parallel to the optical axis for metrology, inspection, and measurement.
• Robust Mechanical Design, Large and elongated housing for stability and easier optical design (95 mm parfocalization length).
• Integrated Interferometry Enhancements, internal beam splitter for efficient light routing, Interference fringe adjustment mechanism for precise control and measurement consistency.
• Applications: Precision brightfield inspection, Industrial metrology and measurement systems, Surface profiling, Quality control in manufacturing lines, Situations where large working clearances are required

Available models:

• M Plan Apo Series: 1× to 100× magnification
• M Plan Apo HR (High Resolution): Higher NA for fine-detail imaging
• M Plan Apo SL (Super Long Working Distance): Extended WD for specialty applications

(Working distances range from ~34 mm at low magnifications down to ~1.3 mm at high magnifications.)

• Broad spectral range coverage with NIR models corrected from 480 to 1800 nm—ideal for Nd:YAG laser cutting and telecommunication inspection.
• NUV and UV models optimized for key Nd:YAG laser harmonics at 532 nm, 355 nm, and 266 nm.
• Long working distances providing significant clearance between the lens and sample, suitable for semiconductor inspection, machine vision, and non-contact measurement.
• Available HR series with increased NA for smaller spot sizes and finer detail resolution.
• The LCD Infinity Corrected Objectives include the additional capability to compensate for typical LCD glass thicknesses (0.7 mm or 1.1 mm). This feature enables precise brightfield imaging and laser-based measurements through LCD glass or other protective covers, making them especially well-suited for applications requiring inspection or defect detection behind such substrates.
• Applications for these objectives encompass brightfield imaging (UV, visible, and NIR), laser-based inspection and processing, semiconductor and electronics testing, machine vision, defect detection (including behind cover glasses like LCD panels), and advanced metrology where long working distances and high precision are critical.

• Glass Thickness Compensation allowing observation through glass thicknesses up to 3.5 mm, making them ideal for inspecting LCDs, semiconductors, flat screen monitors, or imaging into vacuum cells.
• Ultra-Long Working Distances for flexible sample clearance, suitable for various applications including life sciences (imaging through coverslips, agar, water, or nutrient mediums).
• Plan Apochromatic Design ensuring high contrast, corrected chromatic aberrations in the 436–656 nm wavelength range, and flat field imaging.
• Applications: extend to brightfield imaging through protective glass in industrial, scientific, and life science contexts, including advanced inspection tasks and imaging in specialized optical setups like vacuum cells or optical traps. These objectives provide a combined solution for demanding imaging scenarios where both long working distance and thick glass compensation are critical.