REFLEKTOMETRY i ELIPSOMETRY

 

Wybór pomiędzy reflektometrem a elipsometrem uzależniony jest od liczby i grubości warstw, które chcielibyśmy zmierzyć.

Reflektometr NanoCalc

 

NanoCalc is a versatile and configurable thin film measurement system. It is based on spectroscopic reflectometry to accurately determine optical or non-optical thin film thickness. It is suitable for applications in a variety of semiconductor, medical and industrial applications. NanoCalc system measures anti-reflective coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.

The NanoCalc Thin Film Reflectometry System allows you to analyze the thickness of optical layers from 1 nm to 250 µm . You can observe a single thickness with a resolution of 0.1 nm and analyze single-layer or multilayer films in less than one second.

 

  • Reliable – resolution to 0.1 nm
  • Powerful – ability to analyze single- or multi-layers films
  • Portable – ideal for in situ, on-line thickness measurements
  • Sophisticated – algorithms for defect and roughness tolerance measurements

 

Model
Wavelength Range Optical Layer Thickness Repeatability Refractive Index Spot Size
NANOCALC-VIS 400-850 nm 50 nm – 100 µm 0.3 nm Yes 200 µm or 400 µm standard; 100 µm available upon request
NANOCALC-XR 250-1050 nm 10 nm – 100 µm 0.3 nm Yes 200 µm or 400 µm standard; 100 µm available upon request
NANOCALC-DUV 190-1100 nm 1 nm – 100 µm 0.3 nm No 400 µm standard; 200 µm available upon request
NANOCALC-NIR 900-1700 nm 100 nm – 250 µm 1.0 nm No 400 µm standard; 200 µm available upon request

 

Engineering Specifications

NanoCalc
Wavelength range: 190-1700 nm
Optical layer thickness: 1 nm – 250 µm
Repeatability: 0.3 nm – 1.0 nm
Optical resolution: 0.1 nm FWHM
Angle of incidence: 90°
Number of layers: Up to 10
Refractive index: Depends on the model
Test materials: Transparent or semi-transparent thin film materials
Reference needed: Yes (bare substrate)
Measurement modes: Reflection and Transmission
Rough materials capable: Yes
Measurement speed: 100 ms to 1 s
On-line capable: Yes
Height adjustment: With COL-UV-6.35 (10-50 mm)
Spot size: Depends on the model
Microspot: Yes (with microscope)
CCD color: Yes (with microscope)
Mapping option: 150 mm (6″) and 300 mm (12″) xy-scanning stages

Elipsometr SpecEl

The SpecEl is a benchtop thin film measurement system utilizing spectroscopic ellipsometry to measure multilayer, semi-transparent samples such as flat wafers or glass plates. The SpecEl ellipsometer measures polarized light reflected from the surface of a substrate to determine the thickness and refractive index of the materials as a function of wavelength. The SpecEl is controlled via a computer.

Measure refractive index, absorbance and thickness with the touch of a button.
 
 
  • Compact – instrument with spectral range from 300-1000 nm
  • Complete System – includes integrated spectrometer, a computer, monitor, broadband light source and controller; software is available separately
  • Convenient – easy placement of the sample and one-button operation

 

Engineering Specifications SpecEl
PHYSICAL  
Dimensions: 257 mm x 152 mm x 263 mm
Weight:   kg
SPECTROSCOPIC  
Spectral range: 300-1000 nm or 400-1000 nm
Optical resolution: 1.0 nm FWHM
Accuracy: 0.1 nm
Angle of incidence: 70°
Beam diameter: 400 x 1200 µm
SYSTEM PERFORMANCE  
Thickness range: 1 nm – 10 µm
Measurement speed: 7 – 13 seconds